test
test
test
test
test
.
NPKT offers full custom layout solutions based on Takumi Technology tools.
Automated Migration and DRC-Correction
NPKT offers tools for layout migration, and is most commonly applied to standard cell migration, automatic DRC-correction and derivative creation. Migration is possible even between seemingly incompatible design styles (example layout styles shown above).
Complex rule support
Complex 2D design rules are supported.
Design rules can be color (double patterning) dependent. Layer color can
be automatically assigned during migration. Migration and automatic
DRC-correction work
flat or hierarchical, and operate in batch on GDS or OASIS, or can be integrated in Virtuoso for pCell maintenance and interactive use.
Standard cell derivatives
Automatic DRC-correction can be used for creating layout derivatives (e.g. std.cell libraries with modified device size and different number of routing tracks).
Preferred rule & yield score improvement
Current manufacturing processes have minimum and recommended design rules, when implemented improve yield score and manufacturability.
Our products will implement rule preferences, without increasing cell size, and while keeping layout DRC and LVS correct. They have been used for cell libraries, embedded memories, analog blocks as well as full chips.
Litho hotspot solving and analysis
Litho hotspots reduce yield mainly in defocus or misalignment conditions. While most hotspots in early stages of process development get fixed by improved OPC decks it makes sense to (automatically) remove hotspots for reduced yield risk.
Our tools will fix hotspots in cell libraries, IP blocks or full chips based on hotspot markers, or imported contours from e.g. commercial tools such as Brion or Calibre LFD. For large data, hotspot fix uses hierarchy analysis and/or layout partitioning over multiple cpus, to provide fast turnaround time.